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论文题目: Natural variation of the Dt2 promoter controls plant height and node number in semi-determinant soybean
英文论文题目: Natural variation of the Dt2 promoter controls plant height and node number in semi-determinant soybean
第一作者: Kou, Kun
英文第一作者: Kou, Kun
联系作者: 刘宝辉,Fang, Chao
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发表年度: 2021
卷: 41
期: 6
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Soybean (Glycine max (L.) Merrill) is an important legume crop worldwide. Plant height (PH) is a quantitative trait that is closely related to node number (NN) and internode length (IL) on the main stem, which together affect soybean yield. To identify candidate genes controlling these three traits in soybean, we examined a recombinant inbred line (RIL) population derived from a cross between two soybean varieties with semi-determinate stems (Dt1Dt1Dt2Dt2), JKK378 and HXW. A quantitative trait locus (QTL) named qPH18 was identified that simultaneously controls PH, NN, and IL; this region harbors the semi-determinant gene Dt2. Sequencing of the Dt2 promoter from JKK378 identified three polymorphisms relative to HXW, including two single nucleotide polymorphism (SNPs) and an 18-bp insertion/deletion polymorphism (Indel). Dt2 expression was lower in the qPH18(JKK378) group than in the qPH18(HXW) group, whereas the expression level of the downstream gene Dt1 showed the opposite tendency. A transient transfection assay confirmed that Dt2 promoter activity is lower in JKK378 compared to HXW. We propose that the polymorphisms in the dominant Dt2 promoter underlie the differences in Dt2 expression and its downstream gene Dt1 in the two parents, thereby affecting PH, NN, IL, and grain weight per plant without altering stem growth habit. Compared to the PH18(HXW) allele, the qPH18(JKK378) allele suppresses Dt2 expression, which releases the inhibition of Dt1 expression, thus enhancing NN and grain yield. Our findings shed light on the mechanism underlying NN and PH in soybean and provide a molecular marker to facilitate breeding.

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英文刊物名称: Molecular Breeding
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英文参与作者: K. Kou, T. Su, Y. P. Wang, H. Yang, H. Du, M. L. He, T. Li, L. X. Ma, C. M. Liao, C. Yang, W. Q. Shi, L. N. Chen, Y. L. Li, B.
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